10 MeV proton damage in β-Ga2O3 Schottky rectifiers
2018 · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
저자
Jiancheng Yang, Zhiting Chen, Fan Ren, S. J. Pearton, Gwangseok Yang, 김지현 (Jihyun Kim), Jonathan Lee, Elena S. Flitsiyan, Leonid Chernyak, Akito Kuramata
연구주제
Ga2O3 and related materials · Radiation Effects in Electronics
NTIS 과학기술표준분류
가장 가까운 분류(전기/전자 > 반도체 소자·회로 > 화합물소자)가 화학·화공 범위 밖이다. 배정 근거: AI 키워드가 잡은 NTIS 과제의 분류.
AI 연구 키워드·방법
베타 산화갈륨(β-Ga2O3) 캐리어 제거율 양성자 조사 쇼트키 다이오드
키워드 (OpenAlex)
β-Ga2O3 Schottky rectifiers proton irradiation radiation damage carrier removal rate point defects trap states annealing
초록
The electrical performance of vertical geometry Ga2O3 rectifiers was measured before and after 10 MeV proton irradiation at a fixed fluence of 1014 cm−2, as well as subsequent annealing up to 450 °C. Point defects introduced by the proton damage create trap states that reduce the carrier concentration in the Ga2O3, with a carrier removal rate of 235.7 cm−1 for protons of this energy. The carrier removal rates under these conditions are comparable to GaN-based films and heterostructures. Even annealing at 300 °C produces a recovery of approximately half of the carriers in the Ga2O3, while annealing at 450 °C almost restores the reverse breakdown voltage. The on/off ratio of the rectifiers was severely degraded by proton damage and this was only partially recovered by 450 °C annealing. The minority carrier diffusion length decreased from ∼340 nm in the starting material to ∼315 nm after th…
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