Electric Field-Assisted Agglomeration of Trace Nanoparticle Impurities for Ultrahigh Purity Chemicals

With the advancement of semiconductor manufacturing technology, the effects of trace impurities in industrial chemicals have grown significantly. In industrial processes, conventional purification methods, such as filtration and distillation, have reached their limits for removing nanoparticles from aqueous and acidic solutions. Especially, silicon and silicate are two fundamental byproducts in semiconductor fabrication processes. Assembly and subsequent removal of these materials at the nanoparticle level have been confronted with significant challenges. Therefore, it is imperative to develop technologies to effectively control and remove these impurities for next-generation manufacturing processes. In this study, we explored the use of electric field-assisted assembly to agglomerate silicate and silicon nanoparticles in industry-standard aqueous and acidic solutions. By applying an alt…