Effects of Unusual Gate Current on the Electrical Properties of Oxide Thin-Film Transistors
2018 · Scientific Reports
저자
Jinwon Lee, Keon‐Hee Lim, 김연상 (Youn Sang Kim)
연구주제
Thin-Film Transistor Technologies · Semiconductor materials and devices · Organic Electronics and Photovoltaics
NTIS 과학기술표준분류
가장 가까운 분류(전기/전자 > 디스플레이 > 디스플레이 소재/부품)가 화학·화공 범위 밖이다. 배정 근거: AI 키워드가 잡은 NTIS 과제의 분류.
AI 연구 키워드·방법
gate leakage current oxide semiconductor interface 산화물 박막트랜지스터
키워드 (OpenAlex)
oxide thin-film transistors gate current oxide-semiconductor interface charge states electrostatic shocks
초록
The wide research and development on oxide thin-film transistors (TFTs) have led to considerable changes in mainstream technology in various electronic applications. Up to now, much research has been focusing on enhancing the performance of oxide TFTs and simplifying fabricating process. At the stage of research and development in the oxide TFT, unexpectedly high gate current phenomena have been continuously reported by several groups, but the origins have not been yet studied in detail. The unusual gate current interferes with the conductance of the oxide TFT, which makes it difficult to interpret the performance of the TFT. Here we present the origin and control factors of the unconventional gate currents flow in the oxide TFT. The gate current is due to the conduction of electrons through trap sites in insulators, and the current is sophisticatedly controlled by the structural factors…
이 논문을 지원한 국가R&D 과제 (NTIS 성과)
NTIS 성과DB(2020–24)에서 DOI 매칭 없음
인접 그래프
노드 hover = 이웃 강조 · 1회 클릭 = 고정 · 고정된 노드 다시 클릭 = 페이지 이동
이 문서와 연결된 페이지
교수 1
연구주제 1
Thin-Film Transistor Technologies