Lattice distortion analysis of nonpolar a-plane $$(11\bar 20)$$ GaN films by using a grazing-incidence X-ray diffraction technique
2015 · Journal of the Korean Physical Society
저자
Yong Gon Seo, Jihoon Kim, Sung Min Hwang, 김지현 (Jihyun Kim), Soohwan Jang, Heesan Kim, Kwang Hyeon Baik
연구주제
GaN-based semiconductor devices and materials
NTIS 과학기술표준분류
가장 가까운 분류(재료 > 세라믹재료 > 광/전자세라믹스)가 화학·화공 범위 밖이다. 배정 근거: AI 키워드가 잡은 NTIS 과제의 분류.
AI 연구 키워드·방법
in plane anisotropy 격자 뒤틀림 무극성 질화갈륨(GaN) silicon nitride interlayer
키워드 (OpenAlex)
nonpolar a-plane GaN lattice distortion in-plane anisotropy rocking curves SiNx interlayer heteroepitaxy compressive strain tensile strain
초록
This work examines the anisotropic microstructure and the lattice distortions of nonpolar a-plane $$(11\bar 20)$$ GaN (a-GaN) films by using the grazing-incidence X-ray diffraction technique. Faulted a-GaN films typically exhibit an in-plane anisotropy of the structural properties along the X-ray in-beam directions. For this reason, the anisotropic peak broadenings of the X-ray rocking curves (XRCs) were observed for various angle (phi) rotations for a-GaN films with and without SiN x interlayers. Analysis revealed the peak widths of the XRCs displayed an isotropic behavior for a nonpolar a-GaN bulk crystal. Thus, the in-plane anisotropy of the XRC peak widths for nonpolar a-GaN films apparently originates from the heteroepitaxial growth of the a-GaN layer on a foreign substrate. The lattice distortion analysis identified the presence of compressive strains in both the two in-plane direc…
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연구주제 1
GaN-based semiconductor devices and materials