Proton Irradiation of High Aluminum Content AlGaN Polarization Doped Field Effect Transistors
2020 · ECS Journal of Solid State Science and Technology
저자
Patrick H. Carey, Fan Ren, Jinho Bae, 김지현 (Jihyun Kim), S. J. Pearton
연구주제
GaN-based semiconductor devices and materials · Radiation Effects in Electronics
NTIS 과학기술표준분류
가장 가까운 분류(원자력 > 원자력계측/제어기술 > 센서/검출기 기술)가 화학·화공 범위 밖이다. 배정 근거: AI 키워드가 잡은 NTIS 과제의 분류.
AI 연구 키워드·방법
algan polarization doped field effect transistor 캐리어 제거율 양성자 조사 switching performance
키워드 (OpenAlex)
proton irradiation AlGaN high aluminum content carrier removal rate switching performance GaN HEMT radiation-induced degradation
초록
The effects of proton irradiation dose on the DC and switching properties of high aluminum content, polarization-doped field effect transistors (POLFETs) were studied. The POLFETs were irradiated at proton energy of 10 MeV at fluences of 1 × 10 14 cm −2 and 3 × 10 14 cm −2 . The DC saturation current exhibited a 21 and 36% reduction at fluences of 1 × 10 14 cm −2 and 3 × 10 14 cm −2 , respectively. The carrier removal rates for this energy was 677 cm −1 . However, switching current at 100 kHz demonstrated no change, with near ideal performance, as opposed to significant degradation in their GaN HEMT counterparts. This near ideal performance is attributed to the volume of the 3D electron gas in the POLFETs reducing the likelihood of negatively impacting scattering events, as opposed to the narrow 2D electron gas of the HEMT. The DC degradation and carrier removal rates are on par with rep…
이 논문을 지원한 국가R&D 과제 (NTIS 성과)
NTIS 성과DB(2020–24)에서 DOI 매칭 없음
인접 그래프
노드 hover = 이웃 강조 · 1회 클릭 = 고정 · 고정된 노드 다시 클릭 = 페이지 이동
이 문서와 연결된 페이지
교수 1
연구주제 1
GaN-based semiconductor devices and materials