SNU CBE

Effect of proton irradiation energy on SiNx/AlGaN/GaN metal-insulator semiconductor high electron mobility transistors

2018 · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

저자

Chaker Fares, Fan Ren, S. J. Pearton, Gwangseok Yang, 김지현 (Jihyun Kim), Chien-Fong Lo, J. W. Johnson

연구주제

GaN-based semiconductor devices and materials · Radiation Effects in Electronics

NTIS 과학기술표준분류

가장 가까운 분류(전기/전자 > 반도체 소자·회로 > 화합물소자)가 화학·화공 범위 밖이다. 배정 근거: AI 키워드가 잡은 NTIS 과제의 분류.

AI 연구 키워드·방법

AlGaN/GaN 고전자이동도 트랜지스터(HEMT) 양성자 조사 방사선 유발 열화 silicon nitride gate dielectric

키워드 (OpenAlex)

proton irradiation irradiation energy high electron mobility transistors silicon nitride gate dielectric device degradation carrier removal rate saturation drain current radiation damage

초록

The effects of proton irradiation energy on the electrical properties of SiNx/AlGaN/GaN metal-insulator semiconductor high electron mobility transistors (MISHEMTs) using in situ grown silicon nitride as the gate dielectric were studied. The SiNx/AlGaN/GaN MISHEMT devices were irradiated with protons at energies of 5, 10, or 15 MeV at a fixed fluence of 2.5 × 1014 cm−2. The largest amount of device degradation was shown in the samples irradiated with the lowest irradiation energy of 5 MeV. The DC saturation current was reduced by 10.4%, 3.2%, and 0.5% for MISHEMTs irradiated with proton energies of 5, 10, and 15 MeV, respectively. Device performance degradation was more pronounced in the irradiated samples under high-frequency operation. At a frequency of 100 kHz, the percent saturation drain current reduction at a gate voltage of 3 V was 40%, 19%, and 17% after proton irradiation at 5, 1…

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인접 그래프

노드 hover = 이웃 강조 · 1회 클릭 = 고정 · 고정된 노드 다시 클릭 = 페이지 이동

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교수 1

김지현

연구주제 1

GaN-based semiconductor devices and materials

키워드 3

양성자 조사 · 방사선 유발 열화 · AlGaN/GaN 고전자이동도 트랜지스터(HEMT)