SNU CBE

Effect of alpha-particle irradiation dose on SiNx/AlGaN/GaN metal–insulator semiconductor high electron mobility transistors

2018 · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

저자

Chaker Fares, Fan Ren, S. J. Pearton, Gwangseok Yang, 김지현 (Jihyun Kim), Chien-Fong Lo, J. Wayne Johnson

연구주제

GaN-based semiconductor devices and materials · Radiation Effects in Electronics

NTIS 과학기술표준분류

가장 가까운 분류(전기/전자 > 반도체 소자·회로 > 화합물소자)가 화학·화공 범위 밖이다. 배정 근거: AI 키워드가 잡은 NTIS 과제의 분류.

AI 연구 키워드·방법

AlGaN/GaN 고전자이동도 트랜지스터(HEMT) 알파 입자 조사 방사선 유발 열화 silicon nitride gate dielectric

키워드 (OpenAlex)

alpha particle irradiation radiation dose high electron mobility transistors silicon nitride gate dielectric radioresistance carrier removal rate high-frequency operation

초록

The effects of 18 MeV alpha particle irradiation dose on the electrical properties of SiNx/AlGaN/GaN metal insulator semiconductor high electron mobility transistors (MISHEMTs) using in situ grown silicon nitride as the gate dielectric were investigated. The MISHEMT devices were irradiated with alpha particles at doses of 1 × 1012 or 1 × 1013 cm−2 at a fixed energy of 18 MeV. Device performance degradation was more prominent for the irradiated samples under high frequency operation. At a frequency of 100 kHz and gate voltage pulsed from −6 to 3 V, the saturation drain current reduction was 32% and 41% after alpha irradiation doses of 1 × 1012 and 1 × 1013 cm−2, respectively. The drain current reduction at 100 kHz also depended on the duty cycle. At higher duty cycles, the drain current reduction was less severe. The calculated carrier removal rates were in the range of 2062–2175 cm−1 for…

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NTIS 성과DB(2020–24)에서 DOI 매칭 없음

인접 그래프

노드 hover = 이웃 강조 · 1회 클릭 = 고정 · 고정된 노드 다시 클릭 = 페이지 이동

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교수 1

김지현

연구주제 1

GaN-based semiconductor devices and materials

키워드 3

방사선 유발 열화 · AlGaN/GaN 고전자이동도 트랜지스터(HEMT) · 알파 입자 조사