Facile Multiscale Patterning by Creep-Assisted Sequential Imprinting and Fuel Cell Application

The capability of fabricating multiscale structures with desired morphology and incorporating them into engineering applications is key to realizing technological breakthroughs by employing the benefits from both microscale and nanoscale morphology simultaneously. Here, we developed a facile patterning method to fabricate multiscale hierarchical structures by a novel approach called creep-assisted sequential imprinting. In this work, nanopatterning was first carried out by thermal imprint lithography above the glass transition temperature (Tg) of a polymer film, and then followed by creep-assisted imprinting with micropatterns based on the mechanical deformation of the polymer film under the relatively long-term exposure to mechanical stress at temperatures below the Tg of the polymer. The fabricated multiscale arrays exhibited excellent pattern uniformity over large areas. To demonstrat…