Unidirectional oxide hetero-interface thin-film diode
2015 · Applied Physics Letters
저자
Young-Min Park, Eungkyu Lee, Jinwon Lee, Keon‐Hee Lim, 김연상 (Youn Sang Kim)
연구주제
Semiconductor materials and devices · Thin-Film Transistor Technologies
NTIS 과학기술표준분류
가장 가까운 분류(전기/전자 > 반도체 소자·회로)가 화학·화공 범위 밖이다. 배정 근거: 지원 과제·키워드 근거가 없어 AI가 논문 제목·초록을 읽고 고른 분류.
AI 연구 키워드·방법
current rectification oxide hetero interface diode thin film diode
키워드 (OpenAlex)
thin film diodes oxide thickness current density device yield
초록
The unidirectional thin-film diode based on oxide hetero-interface, which is well compatible with conventional thin-film fabrication process, is presented. With the metal anode/electron-transporting oxide (ETO)/electron-injecting oxide (EIO)/metal cathode structure, it exhibits that electrical currents ohmically flow at the ETO/EIO hetero-interfaces for only positive voltages showing current density (J)-rectifying ratio of ∼105 at 5 V. The electrical properties (ex, current levels, and working device yields) of the thin-film diode (TFD) are systematically controlled by changing oxide layer thickness. Moreover, we show that the oxide hetero-interface TFD clearly rectifies an AC input within frequency (f) range of 102 Hz < f < 106 Hz, providing a high feasibility for practical applications.
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